Strong Higher-Order Fiber Bragg Gratings Written with an Amplitude Mask

J. Wagener, R. Espindola, A. Vengsarkar
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引用次数: 1

Abstract

Reflective Bragg gratings have been written in optical fibers using UV induced index changes. Initial work used a standing wave interference pattern set up by light launched down the fiber core.1 The more versatile techniques of side-writing using bulk interferometric fringes2 and phase-masks3 followed. The field of phase-mask-written Bragg gratings in germano-silicate fibers has matured with the use of specially designed high-photosensitivity fiber and hydrogen loading.4 While gratings written with these methods can be precisely tailored in spectral shape, bandwidth and strength, a precise mask, a coherent laser, and very stable alignment during the exposure are needed. Multiple grating applications, including weak pump-diode stabilizers, fiber laser mirrors, and grating sensors may not require the high precision gratings produced with the phase mask method, but would benefit from an inexpensive mass production technique. In this paper we demonstrate an amplitude mask exposure technique to create strong higher order Bragg reflectors with minimal optics.
用幅度掩模书写的高阶光纤光栅
利用紫外光诱导的折射率变化,已经在光纤中编写了反射布拉格光栅。最初的工作使用了一种驻波干涉模式,这种模式是由光沿着光纤芯发射而形成的更通用的侧写技术使用体干涉条纹和相位掩模。随着特殊设计的高光敏光纤和氢负载的使用,锗硅酸盐光纤的相位掩模写入布拉格光栅领域已经成熟虽然用这些方法编写的光栅可以精确地定制光谱形状,带宽和强度,但需要精确的掩模,相干激光和在曝光期间非常稳定的对准。多种光栅应用,包括弱泵浦二极管稳定器、光纤激光反射镜和光栅传感器,可能不需要用相位掩模方法生产的高精度光栅,但将受益于廉价的大规模生产技术。在本文中,我们展示了一种振幅掩模曝光技术,以最小的光学器件创建强高阶布拉格反射器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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