A 5V-only 16M flash memory using a contactless array of source-side injection cells

S. Tsao, J. Frayer, C.S. Pang, Y. Ma, K. Kwon, Y. Choi, D. Kim, J. Kim, J. Park
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引用次数: 4

Abstract

The source side injection technology coupled with a modified virtual ground contactless array architecture is effective in addressing high density FLASH requirements. We describe a single supply 16 Mbit chip developed in a 0.7 /spl mu/m triple-poly double metal process using a 3.36 /spl mu/m/sup 2/ cell. The design challenge is to implement all the necessary array interface circuitry while maintaining a high array-to-chip area efficiency. This implementation requires unique decoding circuitry on the bitlines and cell control gates.
5v - 16M闪存,采用源侧注射单元的非接触式阵列
源侧注入技术与改进的虚拟地面非接触式阵列架构相结合,有效地解决了高密度闪存的要求。我们描述了一种单电源16 Mbit芯片,采用3.36 /spl mu/m/sup 2/电池,以0.7 /spl mu/m三聚双金属工艺开发。设计的挑战是实现所有必要的阵列接口电路,同时保持高阵列到芯片的面积效率。这种实现需要位线和单元控制门上的独特解码电路。
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