{"title":"TiO/sub 2/ thin films prepared by sol-gel method for oxygen microsensor application","authors":"M. Atashbar, H. Sun, W. Wlodarski","doi":"10.1109/COMMAD.1996.610172","DOIUrl":null,"url":null,"abstract":"Polycrystalline TiO/sub 2/ thin films have been prepared via a sol-gel method. The film morphology, crystalline phase and chemical composition have been characterized through scanning electron microscopy, X-ray diffraction, and Rutherford backscattering spectrometry. The oxygen sensing characteristics and sensitivity enhancement have been investigated and optimized. The gas sensitivity of TiO/sub 2/ thin films for the detection of oxygen in the concentration range 10 ppm to 1%, has been evaluated. A sensitivity range between 5 to 8 at working temperatures of 270/spl deg/C to 320/spl deg/C has been achieved.","PeriodicalId":171952,"journal":{"name":"1996 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings","volume":"10 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1996 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/COMMAD.1996.610172","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
Polycrystalline TiO/sub 2/ thin films have been prepared via a sol-gel method. The film morphology, crystalline phase and chemical composition have been characterized through scanning electron microscopy, X-ray diffraction, and Rutherford backscattering spectrometry. The oxygen sensing characteristics and sensitivity enhancement have been investigated and optimized. The gas sensitivity of TiO/sub 2/ thin films for the detection of oxygen in the concentration range 10 ppm to 1%, has been evaluated. A sensitivity range between 5 to 8 at working temperatures of 270/spl deg/C to 320/spl deg/C has been achieved.