{"title":"Heat-Resistance of Mo/Si Multilayer EUV Mirrors with Interleaved Carbon Barrier-Layers","authors":"H. Takenaka, T. Kawamura, T. Haga","doi":"10.1364/eul.1996.rmc169","DOIUrl":null,"url":null,"abstract":"Introducing interleaved carbon barrier-layers improves the heat resistance of Mo/Si multilayers . The soft x-ray reflectivities of the multilayers were calculated, and the effects of heating on both the reflectivities and layer structures of Mo/C/Si/C and Mo/Si multilayers were investigated using x-ray diffraction and transmission electron microscopy. The results show that, for applications using intense soft x-ray beams, Mo/Si multilayers with interleaved carbon barrier-layers are better mirrors than Mo/Si multilayers because they have much better heat resistance and almost the same EUV reflectivity.","PeriodicalId":201185,"journal":{"name":"Extreme Ultraviolet Lithography (TOPS)","volume":"118 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Extreme Ultraviolet Lithography (TOPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/eul.1996.rmc169","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
Introducing interleaved carbon barrier-layers improves the heat resistance of Mo/Si multilayers . The soft x-ray reflectivities of the multilayers were calculated, and the effects of heating on both the reflectivities and layer structures of Mo/C/Si/C and Mo/Si multilayers were investigated using x-ray diffraction and transmission electron microscopy. The results show that, for applications using intense soft x-ray beams, Mo/Si multilayers with interleaved carbon barrier-layers are better mirrors than Mo/Si multilayers because they have much better heat resistance and almost the same EUV reflectivity.