{"title":"Fabrication of microprobe array with sub-100 nm nano-heater for nanometric thermal imaging and data storage","authors":"Dongwan Lee, T. Ono, T. Abe, M. Esashi","doi":"10.1109/MEMSYS.2001.906514","DOIUrl":null,"url":null,"abstract":"A novel fabrication method of a micro-thermal probe and its array for nanometric thermal imaging and a technological approach for probe-based data storage are presented. A small metal wire for a nano-heater is fabricated at the apex of a pyramidal SiO/sub 2/ tip, which is formed by low temperature oxidation of a silicon etch-pit at 950/spl deg/C, consecutive metal deposition (Pt/Cr or Au/Cr) to fill the metal into the etch-pit, and etching of the SiO/sub 2/ in buffered HF solution. Another metal (Ni) is deposited on the small wire to form a metal-to-metal junction that enables to measure the temperature at the tip end. Metal feed-through are formed on a glass substrate that is bonded with the probe array, which enables to transmit a high-speed signal to a processing-circuit and increase the probe array density. Using the thermal probe, temperature distribution on a sample surface is measured. The heating capability of nano-heater is confirmed by the resistivity change and thermophoton emission from the nano-heater when flowing a small current into the nano-heater. By using a micro-probe, preliminary experiment for data writing and erasing is performed on phase change medium.","PeriodicalId":311365,"journal":{"name":"Technical Digest. MEMS 2001. 14th IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.01CH37090)","volume":"18 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-01-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"22","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Technical Digest. MEMS 2001. 14th IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.01CH37090)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MEMSYS.2001.906514","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 22
Abstract
A novel fabrication method of a micro-thermal probe and its array for nanometric thermal imaging and a technological approach for probe-based data storage are presented. A small metal wire for a nano-heater is fabricated at the apex of a pyramidal SiO/sub 2/ tip, which is formed by low temperature oxidation of a silicon etch-pit at 950/spl deg/C, consecutive metal deposition (Pt/Cr or Au/Cr) to fill the metal into the etch-pit, and etching of the SiO/sub 2/ in buffered HF solution. Another metal (Ni) is deposited on the small wire to form a metal-to-metal junction that enables to measure the temperature at the tip end. Metal feed-through are formed on a glass substrate that is bonded with the probe array, which enables to transmit a high-speed signal to a processing-circuit and increase the probe array density. Using the thermal probe, temperature distribution on a sample surface is measured. The heating capability of nano-heater is confirmed by the resistivity change and thermophoton emission from the nano-heater when flowing a small current into the nano-heater. By using a micro-probe, preliminary experiment for data writing and erasing is performed on phase change medium.