Well-tempered MOSFETs: 1D versus 2D quantum analysis

A. Abramo, L. Selmi, Z. Yu, R. Dutton
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引用次数: 2

Abstract

This paper presents the two-dimensional quantum mechanical simulation of scaled "well-tempered MOSFETs" (Assad et al, IEDM Tech. Dig., p. 547, 1999, and IEEE trans. Electron Dev. vol. 47, p. 232, 2000) featuring different effective channel lengths in the deep sub-micron range. The simulation results were obtained by means of a two-dimensional Schrodinger solver that had been previously applied to idealized MOS structures. Comparison between one- and two dimensional approaches is presented, and the difference between the two models are highlighted.
调质mosfet:一维与二维量子分析
本文介绍了缩放“良调质mosfet”的二维量子力学模拟(阿萨德等人,IEDM Tech. Dig)。, p. 547, 1999, and IEEE trans。电子发展,vol. 47, p. 232, 2000)在深亚微米范围内具有不同的有效通道长度。模拟结果是通过二维薛定谔求解器得到的,该方法已经应用于理想的MOS结构。给出了一维和二维方法的比较,并强调了两种模型之间的差异。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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