Quinary TlGaInNAs DQW Structures: Effect of Growth Temperature and Growth Rate on Tl Incorporation

D. Krishnamurthy, A. Fujiwara, S. Hasegawa, H. Asahi
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引用次数: 1

Abstract

TIGalnNAs-based DQW structures grown at various growth parameters were studied by secondary ion mass spectroscopy (SIMS). Enhanced Tl incorporation could be obtained using TlGaNAs barriers. A direct relationship between the Tl incorporation and N composition is clearly established by the analysis of the effect of growth temperature, growth rate, ECR power and nitrogen flow rate. The Tl incorporation increased with the increase of Tl flux in the case of DQW structures with TlGaAs barriers. In the case of DQW structures with TIGaNAs barriers, the Tl incorporation reached saturation at some Tl flux, indicating the N enhanced higher Tl incorporation.
TlGaInNAs DQW结构:生长温度和生长速率对Tl掺入的影响
利用二次离子质谱(SIMS)研究了在不同生长参数下生长的tigalnas基DQW结构。利用TlGaNAs屏障可以增强Tl的掺入。通过分析生长温度、生长速率、ECR功率和氮流量的影响,明确了Tl掺入与N组成之间的直接关系。在具有TlGaAs势垒的DQW结构中,Tl掺入量随着Tl通量的增加而增加。对于具有TIGaNAs势垒的DQW结构,在某些Tl通量下,Tl掺入达到饱和,表明N增强了较高的Tl掺入。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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