Improvement the Q-factor of multi-band inductor with 90 μm silicon substrate on plastic

H. M. Chang, H. Kao, S. Shih, Y. C. Lee, C. Ke, L. Chang, C. H. Wu, J. S. Fu, N. Karmakar
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引用次数: 0

Abstract

This paper presents the multi-band inductor with 0.18 μm CMOS technology on plastic achieves high Q-factor and small size for multiband applications. The multi-band inductor on VLSI-standard Si Substrate is operated at ultra-wide band range. The operation frequencies are near 3 GHz, 4 GHz, 7.5 GHz and 9 GHz of the Q-factor are 6.5, 6.7, 8 and 11.5 with the inductance 2.1, 1.6, 1.1, 0.6 nH, respectively. After thinning-down the Si substrate to 90 μm and mounting on plastic, the Q-factor can improve 25~31% without changing the inductance due to reducing the parasitic effect from Si-substrate.
用90 μm硅衬底改进了塑料多带电感的q系数
本文提出了一种采用0.18 μm CMOS技术的多波段电感器,实现了高q因子和小尺寸的多波段应用。基于vlsi标准Si衬底的多波段电感器工作在超宽带范围内。工作频率在3ghz、4ghz、7.5 GHz和9ghz附近,q因子分别为6.5、6.7、8和11.5,电感分别为2.1、1.6、1.1、0.6 nH。将Si衬底薄化至90 μm,安装在塑料上后,由于减小了Si衬底的寄生效应,在不改变电感的情况下,q因子提高了25~31%。
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