Challenges for VUV lithography

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference Pub Date : 1999-07-06 DOI:10.1109/IMNC.1999.797473

M. Sasago

引用次数: 0

Abstract

The paper discusses the challenges of current optical lithography processes such as VUV lithography. Future miniaturization trends in semiconductor production are also discussed.

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VUV光刻面临的挑战

本文讨论了当前光学光刻工艺如VUV光刻所面临的挑战。讨论了半导体生产的未来小型化趋势。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference

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