{"title":"DFM, DFY, Debug and Diagnosis: The Loop to Ensure Yield","authors":"S. Venkataraman","doi":"10.1109/ISQED.2007.61","DOIUrl":null,"url":null,"abstract":"Semiconductor yield has traditionally been limited by random particle-defect based issues.However, as the feature sizes reduced to 0.13 micron and below, systematic mechanism-limited yield loss began to appear as a substantial component in yield loss. In addition, it is becoming clear that ramping yield would take longer and final yields would not reach historical norms.","PeriodicalId":302936,"journal":{"name":"IEEE International Symposium on Quality Electronic Design","volume":"123 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-03-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE International Symposium on Quality Electronic Design","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISQED.2007.61","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Semiconductor yield has traditionally been limited by random particle-defect based issues.However, as the feature sizes reduced to 0.13 micron and below, systematic mechanism-limited yield loss began to appear as a substantial component in yield loss. In addition, it is becoming clear that ramping yield would take longer and final yields would not reach historical norms.