Memory testing improvements through different stress conditions

A. Majhi, M. Azimane, G. Gronthoud, M. Lousberg, S. Eichenberger, Fred Bowen
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引用次数: 1

Abstract

This paper presents the effectiveness of various stress conditions (mainly voltage and frequency) on detecting the resistive shorts and open defects in deep sub-micron embedded memories in an industrial environment. Simulation studies on very-low voltage, high voltage and at-speed testing show the need of the stress conditions for high quality products. The above test conditions have been validated to screen out the bad chips on real silicon (on a test-chip) built on CMOS 0.18 /spl mu/m technology.
不同压力条件下记忆测试的改善
本文介绍了工业环境下各种应力条件(主要是电压和频率)对深亚微米嵌入式存储器中电阻性短路和开放缺陷检测的有效性。对极低电压、高压和高速试验的仿真研究表明,高质量产品需要应力条件。上述测试条件已经过验证,可以在基于CMOS 0.18 /spl mu/m技术的实际硅(在测试芯片上)上筛选出不良芯片。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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