A. Majhi, M. Azimane, G. Gronthoud, M. Lousberg, S. Eichenberger, Fred Bowen
{"title":"Memory testing improvements through different stress conditions","authors":"A. Majhi, M. Azimane, G. Gronthoud, M. Lousberg, S. Eichenberger, Fred Bowen","doi":"10.1109/ESSCIR.2005.1541619","DOIUrl":null,"url":null,"abstract":"This paper presents the effectiveness of various stress conditions (mainly voltage and frequency) on detecting the resistive shorts and open defects in deep sub-micron embedded memories in an industrial environment. Simulation studies on very-low voltage, high voltage and at-speed testing show the need of the stress conditions for high quality products. The above test conditions have been validated to screen out the bad chips on real silicon (on a test-chip) built on CMOS 0.18 /spl mu/m technology.","PeriodicalId":239980,"journal":{"name":"Proceedings of the 31st European Solid-State Circuits Conference, 2005. ESSCIRC 2005.","volume":"75 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-12-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the 31st European Solid-State Circuits Conference, 2005. ESSCIRC 2005.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ESSCIR.2005.1541619","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
This paper presents the effectiveness of various stress conditions (mainly voltage and frequency) on detecting the resistive shorts and open defects in deep sub-micron embedded memories in an industrial environment. Simulation studies on very-low voltage, high voltage and at-speed testing show the need of the stress conditions for high quality products. The above test conditions have been validated to screen out the bad chips on real silicon (on a test-chip) built on CMOS 0.18 /spl mu/m technology.