{"title":"Stable flow gas delivery system for low pressure liquefied gases","authors":"H. Takagi, M. Ino, M. Tabata, Y. Nishikawa","doi":"10.1109/ISSM.2000.993694","DOIUrl":null,"url":null,"abstract":"This paper describes the possibility to supply the low vapor pressure liquefied gas at stable pressure and relatively high flow rate by a system called all vapor phase gas delivery system, together with evaluation test results using WF/sub 6/ and BCl/sub 3/.","PeriodicalId":104122,"journal":{"name":"Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)","volume":"75 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-09-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.2000.993694","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
This paper describes the possibility to supply the low vapor pressure liquefied gas at stable pressure and relatively high flow rate by a system called all vapor phase gas delivery system, together with evaluation test results using WF/sub 6/ and BCl/sub 3/.