Optimizing the cleaning process through cleaning efficiency examination

V. Sítko, M. Saffer, I. Szendiuch, M. Bursik
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引用次数: 1

Abstract

The paper explores the efficiency of cleaning methods in order to select a method and optimize cleaning as a part of assembly manufacturing process in microelectronics. To find out the advantages and potentialities of each single cleaning method it is necessary to use simple but reliable evaluation method. In this paper are under consideration two different methods for contamination evaluation, the first being the standard one using the contaminometer, and the second, new one, which is developed on an optical principle. The new method for cleaning evaluation is based on measuring the contamination in special substrate pattern using a scanning unit (programmable automated optical inspection). The special pattern was designed and realized on a glass substrate with ceramic chip models. The experimental part presents the efficiency examination and compares ultrasonic cleaning in microemulsion to other methods like spray in the air etc. The results of this study are used in optimizing and adjusting cleaning equipments as well as in their improvement and innovation.
通过清洗效率检查优化清洗流程
本文探讨了清洗方法的效率,以便选择一种方法并优化清洗作为微电子组装制造过程的一部分。为了找出每种单一清洗方法的优点和潜力,有必要采用简单可靠的评价方法。本文讨论了两种不同的污染评价方法,第一种是使用污染计的标准方法,第二种是基于光学原理开发的新方法。该方法是利用扫描装置(可编程自动光学检测)测量特定基片图案的污染程度。利用陶瓷芯片模型在玻璃基板上设计并实现了特殊的图案。实验部分进行了效率检验,并与空气喷雾等其他方法进行了比较。研究结果可用于清洗设备的优化和调整,以及清洗设备的改进和创新。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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