Wigner Monte Carlo approach to quantum and dissipative transport in Si-MOSFETs

S. Koba, H. Tsuchiya, M. Ogawa
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引用次数: 2

Abstract

We investigate the influences of quantum transport and scattering effects in Si double-gate MOSFETs based on Wigner Monte Carlo (WMC) approach. It is shown that quantum reflection effect makes significant differences in microscopic features of electron transport between classical and quantum approaches and can even reduce drain current at on-state, but it does not necessarily produce drastic change in macroscopic properties including the drain current. On the other hand, source-drain direct tunneling crucially degrades the subthreshold properties in scaled MOSFETs with sub-10 nm gate length. Furthermore, the ability of the WMC method to describe quantum-classical transition of carrier transport is demonstrated.
si - mosfet中量子和耗散输运的维格纳-蒙特卡罗方法
基于维格纳-蒙特卡罗(WMC)方法研究了Si双栅mosfet中量子输运和散射效应的影响。结果表明,量子反射效应使经典方法和量子方法之间的电子输运微观特征有显著差异,甚至可以降低导通态的漏极电流,但并不一定会引起包括漏极电流在内的宏观性质的剧烈变化。另一方面,源漏直接隧道效应严重降低了栅极长度小于10nm的mosfet的亚阈值特性。此外,还证明了WMC方法描述载流子输运量子经典跃迁的能力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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