GaN/AlGaN based complementary p+-p−-p-n+ ATT-device for application in THz Imaging

M. Mukherjee, P. R. Tripathy, S. P. Pati
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Abstract

A detailed simulation investigation is carried out on the hetero-structure complimentary (p+-p--p-n+) IMPATT oscillator for Terahertz power generation. It is observed that this newly proposed GaN/AlGaN IMPATT may generate a pulsed power density of ~8×1010 Wm-2 with an efficiency of 11%, whereas it's flatly doped counterpart is capable of delivering a pulsed power density of only 3×1010 Wm-2 with 7% efficiency. The total parasitic series resistance, RS, including that due to the un-depleted region in device and also the effects of ohmic contact resistances, has been found to be a major problem that reduces the negative resistance significantly and thus it has a detrimental effect on THz oscillation of the device. The study reveals that the value of RS decreases by 40% as the structure, semiconductor material pair as well as doping profile of the diode changes suitably from conventional to the proposed hetero-structure p+-p--p-n+ type, by incorporating a 300A0 Al0.4Ga0.6N layer in the p-drift region. This first study will be a useful guide in the THz-sector to meet the ever-increasing demand of semiconductor THz-sources for application in Imaging or in improvised explosive device (IED) detection.
基于GaN/AlGaN的互补p+-p−-p-n+ at器件在太赫兹成像中的应用
对用于太赫兹发电的异质结构互补(p+-p—p-n+) IMPATT振荡器进行了详细的仿真研究。观察到,新提出的GaN/AlGaN IMPATT可以产生~8×1010 Wm-2的脉冲功率密度,效率为11%,而平坦掺杂的IMPATT只能产生3×1010 Wm-2的脉冲功率密度,效率为7%。总寄生串联电阻RS,包括由于器件中未耗尽区域和欧姆接触电阻的影响,已被发现是显著降低负电阻的主要问题,从而对器件的太赫兹振荡产生不利影响。研究表明,通过在p漂移区加入300A0 Al0.4Ga0.6N层,当二极管的结构、半导体材料对以及掺杂谱从传统的p+-p—p-n+型转变为异质结构时,RS值降低了40%。该研究将为太赫兹领域提供有用的指导,以满足成像或简易爆炸装置(IED)探测中对半导体太赫兹源日益增长的需求。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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