{"title":"Optimized CMP operation by extended X-factor theory including offline unit hour","authors":"M. Kishimoto, K. Ozawa","doi":"10.1109/ISSM.2000.993619","DOIUrl":null,"url":null,"abstract":"We focus on operator efficiency in the CMP (chemical mechanical polishing) operation, which, as a typical manually operated tool, influences cycle time. The main purpose is to optimize CMP operation by using online/offline unit hour analysis and X-factor theory, and describe the relationship between operator headcount and cycle time. The online/offline unit hour analysis has been designed to optimize operator allocation and headcount in our production line in order to archive the shortest cycle time.","PeriodicalId":104122,"journal":{"name":"Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)","volume":"64 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-09-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.2000.993619","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
We focus on operator efficiency in the CMP (chemical mechanical polishing) operation, which, as a typical manually operated tool, influences cycle time. The main purpose is to optimize CMP operation by using online/offline unit hour analysis and X-factor theory, and describe the relationship between operator headcount and cycle time. The online/offline unit hour analysis has been designed to optimize operator allocation and headcount in our production line in order to archive the shortest cycle time.