Flash memories: a review

M. Gill
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引用次数: 2

Abstract

Summary form only given. Many approaches are being used to manufacture or develop flash memory products to meet various market needs. These approaches can be classified broadly according to programming mechanism: channel hot electron (including source-side injection) and Fowler-Nordheim tunnelling. Some of the technologies in manufacturing or in development are: NOR stack gate, split gate, source-side injection NAND, DINOR, AND. In addition, a host of technologies for embedded flash applications are in different stages of development. Multi-level cell technologies are being developed to reduce cost/bit. 3-D structures are being investigated to realize small cell size. This paper reviews the different memory technologies, principles of operation, the status, the tradeoffs in cost, performance and reliability. It also discusses emerging flash technologies to serve industrial and next generation consumer electronic products including low voltage, low power portable and mobile devices.
闪记忆:回顾
只提供摘要形式。为了满足不同的市场需求,闪存产品的制造和开发采用了多种方法。这些方法可以根据编程机制大致分为通道热电子(包括源侧注入)和Fowler-Nordheim隧道。一些正在制造或开发的技术有:NOR堆叠门、分栅、源侧注入NAND、DINOR和AND。此外,嵌入式flash应用程序的许多技术正处于不同的开发阶段。为了降低成本,人们正在开发多级蜂窝技术。三维结构正在被研究以实现小细胞尺寸。本文综述了不同的存储技术,工作原理,现状,成本,性能和可靠性的权衡。它还讨论了新兴的闪存技术,以服务于工业和下一代消费电子产品,包括低电压,低功耗便携式和移动设备。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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