Energy/Power Breakdown of Pipelined Nanometer Caches (90nm/65nm/45nm/32nm)

Samuel Rodríguez, B. Jacob
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引用次数: 71

Abstract

As transistors continue to scale down into the nanometer regime, device leakage currents are becoming the dominant cause of power dissipation in nanometer caches, making it essential to model these leakage effects properly. Moreover, typical microprocessor caches are pipelined to keep up with the speed of the processor, and the effects of pipelining overhead need to be properly accounted for. In this paper, we present a detailed study of pipelined nanometer caches with detailed energy/power dissipation breakdowns showing where and how the power is dissipated within a nanometer cache. We explore a three-dimensional pipelined cache design space that includes cache size (16kB to 512kB), cache associativity (direct-mapped to 16-way) and process technology (90nm, 65nm, 45nm and 32nm). Among our findings, we show that cache bitline leakage is increasingly becoming the dominant cause of power dissipation in nanometer technology nodes. We show that subthreshold leakage is the main cause of static power dissipation, and that gate leakage is, surprisingly, not a significant contributor to total cache power, even for 32nm caches. We also show that accounting for cache pipelining overhead is necessary, as power dissipated by the pipeline elements is a significant part of cache power
流水线纳米缓存(90nm/65nm/45nm/32nm)的能量/功率分解
随着晶体管继续缩小到纳米级,器件泄漏电流正在成为纳米缓存中功耗的主要原因,因此正确模拟这些泄漏效应至关重要。此外,典型的微处理器缓存是流水线的,以跟上处理器的速度,流水线开销的影响需要适当地考虑。在本文中,我们对流水线纳米缓存进行了详细的研究,并提供了详细的能量/功耗分解,显示了纳米缓存中功率的耗散位置和方式。我们探索了一个三维流水线缓存设计空间,包括缓存大小(16kB到512kB)、缓存关联性(直接映射到16路)和工艺技术(90nm、65nm、45nm和32nm)。在我们的研究结果中,我们发现缓存位线泄漏越来越成为纳米技术节点功耗的主要原因。我们表明,亚阈值泄漏是静态功耗的主要原因,并且栅极泄漏,令人惊讶的是,即使对于32nm缓存,也不是总缓存功耗的重要贡献者。我们还表明,考虑缓存管道开销是必要的,因为管道元素消耗的功率是缓存功率的重要组成部分
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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