Scaling impact on analog performance of sub-100nm MOSFETs for mixed mode applications

M. Garg, S. Suryagandh, J. Woo
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引用次数: 20

Abstract

The recent explosion in the demand for mobile telecommunication, computing and multimedia applications has resulted in much interest in system on chip (SOC) applications. In this work, an analysis of the analog characteristics of scaled MOSFETs is presented. An analog performance metric of intrinsic gain, f/sub T/, linearity, and g/sub m//I/sub ds/ ratio is considered. The effect of scaling on various trade-offs is presented It has been shown that while scaling gate length (L/sub g/) improves various trade-offs, scaling oxide thickness (T/sub ox/) and source/drain extension junction depth (X/sub j/) do not impact trade-offs significantly and they can be set by other constraints such as power supply and gate leakage currents.
缩放对混合模式应用中亚100nm mosfet模拟性能的影响
最近对移动通信、计算和多媒体应用的需求激增导致了对片上系统(SOC)应用的极大兴趣。本文分析了缩放mosfet的模拟特性。考虑了固有增益、f/sub T/、线性度和g/sub m//I/sub ds/比率的模拟性能指标。研究表明,虽然缩放栅极长度(L/sub g/)可以改善各种权衡,但缩放氧化物厚度(T/sub ox/)和源/漏极延伸结深度(X/sub j/)不会显著影响权衡,它们可以由其他约束条件(如电源和栅极泄漏电流)设置。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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