R. Koerner, M. Oehme, K. Kostecki, I. Fischer, E. Rolseth, S. Bechler, M. Yorgidis, A. Blech, O. Latzl, J. Schulze
{"title":"The Zener-Emitter: Electron injection by direct-tunneling in Ge LEDs for the on-chip Si light source","authors":"R. Koerner, M. Oehme, K. Kostecki, I. Fischer, E. Rolseth, S. Bechler, M. Yorgidis, A. Blech, O. Latzl, J. Schulze","doi":"10.1109/DRC.2016.7548478","DOIUrl":null,"url":null,"abstract":"While monolithically integrated light sources for Si photonics have been investigated using Ge and GeSn on Si substrates [1-3], the challenges in material quality and efficiency remain to be solved. Turning the Group-IV material into a direct semiconductor for CMOS compatible concepts [4] promises enhanced electrical to optical conversion efficiencies. However, the red-shift in emitting wavelength is challenging for the peripheral devices such as modulators and photodetectors in complex optoelectronic integrated circuits (OEICs) [5]. We investigated a new concept by utilizing a reverse biased Ge p+n Zener diode for injection of electrons into a forward biased light emitting Ge p+-i-n diode providing holes for the radiative transition. In Ge, the direct band-to-band tunneling (BTBT) dominates over the phonon assisted indirect BTBT, which is highly beneficial for the Zener-Emitter [6]. Moreover, possible low voltage operation due to highly conductive Ge tunnel diodes and avoidance of current crowding effects by the high-energetic electron filtering mechanism of Zener diodes are further increasing the electrical injection efficiency [7].","PeriodicalId":310524,"journal":{"name":"2016 74th Annual Device Research Conference (DRC)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-06-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 74th Annual Device Research Conference (DRC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DRC.2016.7548478","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
While monolithically integrated light sources for Si photonics have been investigated using Ge and GeSn on Si substrates [1-3], the challenges in material quality and efficiency remain to be solved. Turning the Group-IV material into a direct semiconductor for CMOS compatible concepts [4] promises enhanced electrical to optical conversion efficiencies. However, the red-shift in emitting wavelength is challenging for the peripheral devices such as modulators and photodetectors in complex optoelectronic integrated circuits (OEICs) [5]. We investigated a new concept by utilizing a reverse biased Ge p+n Zener diode for injection of electrons into a forward biased light emitting Ge p+-i-n diode providing holes for the radiative transition. In Ge, the direct band-to-band tunneling (BTBT) dominates over the phonon assisted indirect BTBT, which is highly beneficial for the Zener-Emitter [6]. Moreover, possible low voltage operation due to highly conductive Ge tunnel diodes and avoidance of current crowding effects by the high-energetic electron filtering mechanism of Zener diodes are further increasing the electrical injection efficiency [7].