Improvement of Ag sintering Quality on Cu surface at Hydrogen atmosphere

T. Takemasa, J. Jiu, Junko Seino, K. Suganuma
{"title":"Improvement of Ag sintering Quality on Cu surface at Hydrogen atmosphere","authors":"T. Takemasa, J. Jiu, Junko Seino, K. Suganuma","doi":"10.1109/3DPEIM.2018.8525231","DOIUrl":null,"url":null,"abstract":"Wide-bang gap (WBG) semiconductors such as SiC and GaN have many advantages including energy saving and high power capability and are expected as the new semiconductors substituting traditional Si. To bond these SiC/GaN dies to substrates securely, the die-bonding materials are required to stand high-temperature environment and possess superior heat and electronic-conducting properties as well as excellent reliability. Recently, Ag micron particle paste has been developed to show good performance such as high-temperature raliability and high electronic conductivity. Direct copper bonding (DCB) is the commonly used substrate, of which a Cu face is bonded with dies. Since Cu is easy to be oxidized in air, the substrates have to be coated with a thin layer of Ag to realize bonding and to improve the mechanical property. In this work, a simple two-step sintering process was proposed to omit the complicated Ag-coating process and achieve the stable direct bonding between a Cu surface and a die. The two-steps sintering process included first-step in the air and second-step in hydrogen atmosphere. Shear strength over 20 MPa has been achieved by an opti-mized sintering condition with an affordable Ag micron paste.","PeriodicalId":262974,"journal":{"name":"2018 Second International Symposium on 3D Power Electronics Integration and Manufacturing (3D-PEIM)","volume":"27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 Second International Symposium on 3D Power Electronics Integration and Manufacturing (3D-PEIM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/3DPEIM.2018.8525231","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Wide-bang gap (WBG) semiconductors such as SiC and GaN have many advantages including energy saving and high power capability and are expected as the new semiconductors substituting traditional Si. To bond these SiC/GaN dies to substrates securely, the die-bonding materials are required to stand high-temperature environment and possess superior heat and electronic-conducting properties as well as excellent reliability. Recently, Ag micron particle paste has been developed to show good performance such as high-temperature raliability and high electronic conductivity. Direct copper bonding (DCB) is the commonly used substrate, of which a Cu face is bonded with dies. Since Cu is easy to be oxidized in air, the substrates have to be coated with a thin layer of Ag to realize bonding and to improve the mechanical property. In this work, a simple two-step sintering process was proposed to omit the complicated Ag-coating process and achieve the stable direct bonding between a Cu surface and a die. The two-steps sintering process included first-step in the air and second-step in hydrogen atmosphere. Shear strength over 20 MPa has been achieved by an opti-mized sintering condition with an affordable Ag micron paste.
氢气氛下Cu表面银烧结质量的改善
碳化硅和氮化镓等宽爆隙半导体具有节能、高功率等优点,有望成为取代传统硅的新型半导体。为了将这些SiC/GaN模具安全地粘合在衬底上,要求模具粘合材料能够承受高温环境,具有优异的导热和导电性能以及优异的可靠性。近年来发展起来的银微米颗粒浆料具有高温可靠性和高电子导电性等优良性能。直接铜键合(DCB)是常用的基板,其铜面与模具结合。由于铜在空气中容易被氧化,因此必须在衬底上涂上一层薄银以实现键合并提高机械性能。本文提出了一种简单的两步烧结工艺,省去了复杂的镀银工艺,实现了Cu表面与模具之间稳定的直接结合。两步烧结过程包括第一步在空气中,第二步在氢气气氛中。通过优化烧结条件和价格合理的银微米膏体,获得了20 MPa以上的抗剪强度。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信