N-type SiGe/Ge superlattice structures for terahertz emission

J. Halpin, M. Myronov, S. Rhead, D. Leadley
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Abstract

Challenging n-type QCL structures have been grown using RP-CVD with good crystal quality in the active region. These structures represent significant progress towards terahertz emission from a Si/Ge structure. Similar SiGe superlattice structures reported in the literature have suffered from multiple dislocations entering the active region, [9] (grown on a thick buffer) and [10] (grown on a thin buffer). Detailed characterization will be presented along with growth details of our promising structures.
太赫兹发射的n型SiGe/Ge超晶格结构
利用RP-CVD生长出具有挑战性的n型QCL结构,在活性区具有良好的晶体质量。这些结构代表了从Si/Ge结构向太赫兹发射的重大进展。文献中报道的类似SiGe超晶格结构在进入活性区时有多次位错,[9](生长在厚缓冲层上)和[10](生长在薄缓冲层上)。详细的表征将与我们有前途的结构的生长细节一起提出。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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