Scalability of Fully Planar NAND Flash Memory Arrays Below 45nm

P. Blomme, J. van Houdt
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引用次数: 6

Abstract

We have simulated the coupling ratios in fully planar NAND arrays. We have shown that floating gate interference is no fundamental limitation for channel lengths down to 15 nm. The main limitation for scaling NAND arrays is the loss of control gate coupling due to fringing fields, leading to a strong increase in the programming voltage of the memory cells, even when using a 5 nm EOT IPD.
45纳米以下全平面NAND闪存阵列的可扩展性
我们模拟了全平面NAND阵列的耦合比。我们已经证明,对于通道长度低至15nm的情况,浮栅干扰没有基本限制。缩放NAND阵列的主要限制是由于边缘场导致控制门耦合的损失,导致存储单元的编程电压大幅增加,即使使用5nm EOT IPD也是如此。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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