Study on the Characteristics of S21 and EMI on a Shifted Electromagnetic Band Gap (EBG) Structure

S. Nara
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引用次数: 0

Abstract

AI-EBGs attenuate the through characteristics with broad bands of high frequency. AI-EBGs have structures in which sections of low characteristic impedance and high characteristic impedance are arranged periodically. However, the characteristics of radiated EMI of AI-EBGs are not well known. In this study, the characteristics of S21 and EMI are examined when the patch and the branch sizes are varied while the size of the printed circuit board and the number of patches are kept constant. In addition, the characteristics of S21 and EMI are examined when the dielectric thickness is varied. An AI-EBG structure with a thin dielectric is found to give the optimal S21 and EMI characteristics. Finally, a shifted EBG structure is proposed.
位移电磁带隙(EBG)结构上S21和电磁干扰特性的研究
AI-EBGs对高频宽频带通特性有衰减作用。AI-EBGs具有低特性阻抗段和高特性阻抗段周期性排列的结构。然而,AI-EBGs的辐射电磁干扰特性尚不清楚。在本研究中,研究了当印刷电路板尺寸和贴片数量保持不变的情况下,贴片和支路尺寸发生变化时,S21和电磁干扰的特性。此外,还研究了介电厚度变化时S21和电磁干扰的特性。发现具有薄介质的AI-EBG结构具有最佳的S21和EMI特性。最后,提出了一种移位型EBG结构。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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