Diamond Materials for GaN HEMT near Junction Heat Removal

R. Sandhu, V. Gambin, B. Poust, I. Smorchkova, G. Lewis, R. Elmadjian, D. Li, C. Geiger, B. Heying, M. Wojtowicz, A. Oki, T. Feygelson, K. Hobart, E. Bozorg-Grayeli, K. Goodson
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引用次数: 2

Abstract

Summary form only given. GaN HEMT technology is transforming applications in communications, radar, and electronic warfare by offering more than 5x higher RF transmit power over the existing GaAs-based technologies. The high breakdown voltage and current handling capability of GaN HEMTs enables, for the same device size, a 10x increase in RF power using GaN-based devices in place of conventional GaAs-based devices. However the ultimate power and performance of GaN technology cannot be exploited in real applications due to thermal limitations on performance and reliability. The high power density in GaN HEMTs translates to mega-Watts/cm2 heat dissipation at the device gate region. Increasing the heat conductance near the GaN device junction is critical to reduce device junction temperature for reliable operation and performance. NGAS will report on revolutionary methods being developed to directly integrate high quality, high thermal conductivity diamond materials with more than 4x greater thermal conductivity over existing state-of-the-art GaN HEMT technology.
用于GaN HEMT近结热去除的金刚石材料
只提供摘要形式。GaN HEMT技术通过提供比现有gaas技术高5倍以上的射频发射功率,正在改变通信、雷达和电子战领域的应用。GaN hemt的高击穿电压和电流处理能力使得在相同的器件尺寸下,使用基于GaN的器件代替传统的基于gaas的器件,射频功率增加10倍。然而,由于性能和可靠性的热限制,氮化镓技术的最终功率和性能无法在实际应用中得到充分利用。GaN hemt中的高功率密度转化为器件栅极区域的兆瓦/平方厘米的散热。提高GaN器件结附近的导热系数对于降低器件结温度以实现可靠的运行和性能至关重要。NGAS将报告正在开发的革命性方法,直接集成高质量,高导热金刚石材料,其导热系数比现有最先进的GaN HEMT技术高4倍以上。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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