Review: Advances in BTI modeling for the design of reliable ICs

Alejandro Campos-Cruz, E. Tlelo-Cuautle, G. E. Flores-Verdad
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引用次数: 6

Abstract

A brief review of the impact of Bias-Temperature Instability (BTI) on Integrated Circuits (IC) is presented. The importance of this problem with the performance degradation on commercial IC designs, such as Physical Unclonable Functions (PUF) and Ring Oscillator (RO), which are key elements on security applications, is emphasized. A physical interpretation of this phenomenon is provided along with a brief description of the model's evolution, commonly used to simulate the degradation of transistor's parameters at high temperature and voltage supply conditions. Finally, some reported techniques are described to accomplish a better IC design, from the Process, Temperature and Voltage (PVT) variations point of view, lifetime yield optimization and weak spot detection on circuit's architecture.
综述:可靠集成电路设计中BTI模型的研究进展
本文简要介绍了偏置温度不稳定性对集成电路的影响。强调了该问题在商用IC设计中的重要性,如物理不可克隆功能(PUF)和环形振荡器(RO),它们是安全应用的关键元素。对这一现象的物理解释以及模型演变的简要描述,通常用于模拟高温和高压供电条件下晶体管参数的退化。最后,从工艺、温度和电压(PVT)变化的角度、寿命良率优化和电路结构的弱点检测等方面描述了一些实现更好集成电路设计的技术。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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