Going green with on-site generated fluorine: Sustainable cleaning agent for CVD processes

2008 International Symposium on Semiconductor Manufacturing (ISSM) Pub Date : 2008-10-01 DOI:10.1109/ASMC.2009.5155996

P. Stockman, Greg Shuttleworth

引用次数: 2

Abstract

On-site generated fluorine meets the sustainability requirements for the future of CVD thin-film process chamber cleaning. Rigorous industry safety standards are maintained, GWP and total carbon footprint impacts are greatly reduced, and significant process improvements are available.

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使用现场产生的氟实现绿色:CVD工艺的可持续清洗剂

现场产生的氟满足CVD薄膜工艺室清洁未来的可持续性要求。严格的行业安全标准得以保持，全球变暖潜能值和总碳足迹的影响大大减少，并有重大的工艺改进。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

2008 International Symposium on Semiconductor Manufacturing (ISSM)

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