Influence of discharge power on the intensities of Ar and Ti in high-pressure magnetron sputtering plasma measured using optical emission spectroscopy

Soo Ren How, N. Nayan, J. Lias
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Abstract

In this study, a high-pressure magnetron sputtering plasma was used for plasma discharge with various discharge powers in the mixture of argon-nitrogen discharge. The introduction of nitrogen gas modifies the discharge leading to modifications of plasma parameters and ionization mechanism of transition species. The observation of relative emission of argon and titanium spectral line was using an optical emission spectrometer. The ratio of each species of argon and titanium was plotted and the trend of ionization mechanism was studied. We found that the Ar ion emission intensity increased with the discharge power indicating that the ionization of Ar increased with the discharge power. In addition, the ratio of Ti atom / Ti ion emission intensity increased with the discharge power. The results indicated that the Ti atom increased with the discharge power whereas the increase of Ti ion were not significant.
放电功率对发射光谱法测量高压磁控溅射等离子体中Ar和Ti强度的影响
本研究采用高压磁控溅射等离子体在氩氮混合放电中进行不同放电功率的等离子体放电。氮气的引入改变了放电,从而改变了等离子体参数和过渡种的电离机制。利用光学发射光谱仪对氩和钛谱线的相对发射进行了观测。绘制了各组分氩与钛的比值,并对其电离机理进行了研究。我们发现Ar离子的发射强度随放电功率的增大而增大,表明Ar离子的电离度随放电功率的增大而增大。随着放电功率的增大,钛原子/钛离子发射强度的比值增大。结果表明,随着放电功率的增加,钛原子的含量增加,而钛原子的含量增加不显著。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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