Nanometrology interferometric coordinates measurement system for local probe microscopy

Abstract

We present an overview of approaches to the design of nanometrology measuring setups with a focus on methodology of nanometrology interferometric techniques and associated problems. The design and development of a positioning system with interferometric multiaxis monitoring and control involved for scanning probe microscopy techniques (primarily atomic force microscopy, AFM) for detection of the sample profile is presented. Coordinate position sensing allows upgrading the imaging microscope techniques up to quantified measuring. Especially imaging techniques in the microand nanoworld overcoming the barrier of resolution given by the wavelength of visible light are a suitable basis for design of measuring systems with the best resolution possible. The system is being developed in cooperation with the Czech metrology institute and it is intended to operate as a national nanometrology standard combining local probe microscopy techniques and sample position control with traceability to the primary standard of length.