Dissipative transport in Multigate silicon nanowire transistors

N. Dehdashti, A. Kranti, I. Ferain, Chi-Woo Lee, R. Yan, P. Razavi, R. Yu, J. Colinge
{"title":"Dissipative transport in Multigate silicon nanowire transistors","authors":"N. Dehdashti, A. Kranti, I. Ferain, Chi-Woo Lee, R. Yan, P. Razavi, R. Yu, J. Colinge","doi":"10.1109/SISPAD.2010.5604559","DOIUrl":null,"url":null,"abstract":"Most device simulation packages performing quantum transport modeling in thin body Multigate silicon nanowire devices at nanometer scales neglect the electron-phonon interaction, assuming devices operate in the ballistic regime. Here we perform a detailed study on dissipative quantum transport in multigate silicon nanowire transistor including acoustic and optical phonons in detail using non-equilibrium Green's function formalism in uncoupled mode-space approach. We find out that g-type phonons are the most important mechanisms contributing to current reduction in multigate nanowire both in subthreshold and above threshold region for silicon nanowire with 5nm film thickness. This crucial rule of g-type phonons stay active even for gate lengths below 20nm, which implies that ballistic models are inadequate to capture the device characteristics of nanometre devices.","PeriodicalId":331098,"journal":{"name":"2010 International Conference on Simulation of Semiconductor Processes and Devices","volume":"8 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 International Conference on Simulation of Semiconductor Processes and Devices","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SISPAD.2010.5604559","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

Abstract

Most device simulation packages performing quantum transport modeling in thin body Multigate silicon nanowire devices at nanometer scales neglect the electron-phonon interaction, assuming devices operate in the ballistic regime. Here we perform a detailed study on dissipative quantum transport in multigate silicon nanowire transistor including acoustic and optical phonons in detail using non-equilibrium Green's function formalism in uncoupled mode-space approach. We find out that g-type phonons are the most important mechanisms contributing to current reduction in multigate nanowire both in subthreshold and above threshold region for silicon nanowire with 5nm film thickness. This crucial rule of g-type phonons stay active even for gate lengths below 20nm, which implies that ballistic models are inadequate to capture the device characteristics of nanometre devices.
多栅极硅纳米线晶体管的耗散输运
大多数在纳米尺度上的薄体多栅极硅纳米线器件中执行量子输运建模的器件模拟封装忽略了电子-声子相互作用,假设器件在弹道状态下运行。本文采用非平衡格林函数形式在非耦合模空间方法中对声子和声子在多栅极硅纳米线晶体管中的耗散量子输运进行了详细的研究。研究发现,对于膜厚为5nm的硅纳米线,g型声子是多栅纳米线阈下和阈上电流减小的最重要机制。g型声子的这一关键规则即使在栅极长度低于20nm时也保持活跃,这意味着弹道模型不足以捕捉纳米器件的器件特性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信