Two-Dimensional Physical and Numerical Modelling of InP-based Heterojunction Bipolar Transistors

T. Tauqeer, J. Sexton, F. Amir, M. Missous
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引用次数: 14

Abstract

State-of-the-art HBTs were designed, grown, fabricated and characterized in-house. The novelty of this process was the use of dimeric phosphorus generated from a Gallium Phosphide (GaP) decomposition source, which permitted growth at a fairly low temperature (420degC) while conserving extremely high quality materials. A self-aligned transistor with an emitter area of 5times5 mum2 demonstrated a low offset voltage of 150 mV and high current gain of 90. An excellent agreement with the measured data was achieved using physical modelling packages developed by SILVACO.
基于inp的异质结双极晶体管的二维物理和数值模拟
最先进的HBTs是在内部设计、生长、制造和表征的。该工艺的新颖之处在于使用了由磷化镓(GaP)分解源产生的二聚体磷,它允许在相当低的温度(420摄氏度)下生长,同时保存了极高质量的材料。一个发射极面积为5倍5 mum2的自对准晶体管具有150 mV的低偏置电压和90的高电流增益。使用SILVACO开发的物理建模软件包与测量数据非常吻合。
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