Corrosion Mechanisms of Copper and Gold Ball Bonds

W. Qin
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引用次数: 1

Abstract

Copper ball bonding is the most widely used interconnection method in microelectronic packages. It has enabled many modern technologies, but the bond can fail due to corrosion. This paper concerns quantitative analyses of corrosion products of passing and failing copper ball bonds, and correlation with the corrosion thermodynamics. The role each element in the aluminum-copper intermetallic compound plays during crevice corrosion is described, and relative abundances of the oxidized elements are estimated. New insights regarding mechanisms of the highest vulnerability to corrosion attack in the thin film-stack across the bond are presented. Limited data indicate the same corrosion mechanisms for Au ball bonds.
铜和金球键的腐蚀机理
铜球键合是微电子封装中应用最广泛的互连方法。它使许多现代技术得以实现,但这种结合可能因腐蚀而失效。本文对铜球键通过和失效的腐蚀产物进行了定量分析,并与腐蚀热力学进行了关联。描述了铝铜金属间化合物中各元素在缝隙腐蚀中所起的作用,并估计了氧化元素的相对丰度。提出了关于在跨键的薄膜堆中最易受腐蚀攻击的机制的新见解。有限的数据表明,金球键的腐蚀机制相同。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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