Application of the three-state lithography model for grayscale lithography

Abstract

In this work, we focus on the application of the "three-state lithography model" developed for the production of 3D-topographies in photoresist through grayscale lithography. We demonstrate in detail how the variables of the model are determined and optimized in a parameter definition procedure. The principle work ow for a automated mask generation is shown on a pyramid sample structure. Additionally, we tested a top and bottom anti-reflective coating for the use of surface smoothening. Experiments reveal bottom anti-reflective coating as method of choice to smoothen the surfaces on manufactured 3D-topographies.