A Design Model for Random Process Variability

V. Wang, K. Agarwal, S. Nassif, K. Nowka, D. Markovic
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引用次数: 15

Abstract

A new approach to analyze process variation through measured current variation is introduced. The methodology concludes with a simple and convenient posynomial model for random process variability to bridge the gap between existing statistical methods and circuit design. The model contains only design variables: transistor sizes W and L, and operating points Vgs and Vds. Modeling random process variability in this way allows for adaptability to optimization problems, time efficient methods for gathering statistical information in comparison to Monte Carlo, and an alternative equation for hand analysis.
随机过程变异性的设计模型
介绍了一种通过测量电流变化来分析工艺变化的新方法。该方法总结了一个简单方便的随机过程变异性多项式模型,以弥补现有统计方法与电路设计之间的差距。该模型只包含设计变量:晶体管尺寸W和L,工作点Vgs和Vds。以这种方式建模随机过程可变性允许对优化问题的适应性,与蒙特卡罗相比,收集统计信息的时间效率方法,以及用于手工分析的替代方程。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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