Local versus Global Optimization of Electron Lens System Design

N. H. Mahmoudi Nezhad, M. Niasar, C. W. Hagen, P. Kruit
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引用次数: 2

Abstract

In electron optics, the design of electron lens systems is still a challenge. To optimize such systems, the objective function which should be calculated, depends on the electric potential distribution in the space created by the lenses. To obtain the electric potential, the existing methods are generally based on some mathematical techniques which need to mesh the space of the lens system and derive the electric potential at all mesh points. Hence, calculation of the objective function for such systems are computationally expensive. Therefore, applying a fully automatic optimization routine has not yet been feasible, especially for lens systems with many free variables. Hence, the study of objective-function landscape of such problems has not yet been performed. One of the questions of interest for optical designers, that has not been studied in the literature, is whether this problem can be solved by a local optimizer or is it necessary to apply a global optimizer. Recently we succeeded in implementing a method (based on a so-called SOEM (Second Order Electrode Method) technique) which calculates the electric potential in a fast and reasonably accurate way. In this paper, that method, is implemented to perform the study of local versus global optimization for electron lens design. The global optimization method here is performed by GA (Genetic Algorithm). The objective function is taken to be the probe size of the electron beams at the image plane. The results of our study show that the objective function of this problem has many local minima and the optimization of such problems cannot be handled by a local optimizer. GA is shown to perform well by overcoming these multiple-local minima to arrive at a global minima.
电子透镜系统设计的局部与全局优化
在电子光学中,电子透镜系统的设计仍然是一个挑战。为了优化这样的系统,需要计算的目标函数取决于由透镜产生的空间中的电势分布。为了获得电势,现有的方法一般是基于一些数学技术,需要对透镜系统的空间进行网格化,并求出所有网格点的电势。因此,对于这样的系统,目标函数的计算是非常昂贵的。因此,应用全自动优化程序尚不可行,特别是对于具有许多自由变量的透镜系统。因此,对这类问题的目标函数景观的研究尚未开展。光学设计人员感兴趣的一个问题是,这个问题是否可以通过局部优化器来解决,还是有必要应用全局优化器来解决。最近,我们成功地实现了一种方法(基于所谓的SOEM(二阶电极法)技术),以一种快速而合理准确的方式计算电势。本文将该方法应用于电子透镜设计的局部与全局优化研究。本文采用遗传算法进行全局优化。将目标函数取为电子束在成像平面上的探头尺寸。研究结果表明,该问题的目标函数存在许多局部极小值,局部优化器无法对该问题进行优化。遗传算法通过克服这些多局部最小值来达到全局最小值,从而表现出良好的性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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