190 GHz InP HEMT MMIC LNA with dry etched backside vias

M. Barsky, R. Lai, Y. Kok, M. Sholley, D. Streit, T. Block, P. Liu, E. Sabin, H. Rogers, V. Medvedev, T. Gaier, L. Samoska
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引用次数: 13

Abstract

We report an InP HEMT MMIC LNA incorporating dry etched backside ground plane vias with an on-wafer measured peak gain of 9.6 dB at 190 GHz. The 2-stage balanced LNA exhibited over 7 dB gain across a 30 GHz bandwidth. The high gain and high operating frequency of the amplifier is attributed to the lower source inductance provided by the 25 /spl mu/m dry etched ground vias, the 80 nm T-gate, and the graded In/sub 0.80/Ga/sub 0.20/As channel HEMT.
带干蚀刻背面过孔的190ghz InP HEMT MMIC LNA
我们报道了一种采用干蚀刻背面地平面通孔的InP HEMT MMIC LNA,其在190 GHz时的片上测量峰值增益为9.6 dB。两级平衡LNA在30 GHz带宽上的增益超过7 dB。放大器的高增益和高工作频率归功于25 /spl mu/m干蚀刻接地通孔、80 nm t栅和渐变In/sub 0.80/Ga/sub 0.20/As通道HEMT提供的较低源电感。
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