D. Adams, P. Farfell, M. Jacunski, D. Williams, J. Jakubczak, M. Knoll, J. Murray
{"title":"SONOS Technology For Commercial And Military Nonvolatile Memory Applications","authors":"D. Adams, P. Farfell, M. Jacunski, D. Williams, J. Jakubczak, M. Knoll, J. Murray","doi":"10.1109/NVMT.1993.696961","DOIUrl":null,"url":null,"abstract":"Silicon Oxide Nitride Oxide Semiconductor (SONOS) technology is well suited for military and commercial nonvolatile memory applications. Excellent long term memory retention, radiation hardness, and endurance has been demonstrated with this technology. This paper will summarize our data in these areas for SONOS technology.","PeriodicalId":254731,"journal":{"name":"[1993 Proceedings] Fifth Biennial Nonvolatile Memory Technology Review","volume":"116 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1993-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"[1993 Proceedings] Fifth Biennial Nonvolatile Memory Technology Review","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/NVMT.1993.696961","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 9
Abstract
Silicon Oxide Nitride Oxide Semiconductor (SONOS) technology is well suited for military and commercial nonvolatile memory applications. Excellent long term memory retention, radiation hardness, and endurance has been demonstrated with this technology. This paper will summarize our data in these areas for SONOS technology.