A Commercial Foundry Perspective of SiGe BiCMOS Process Technologies

E. Preisler
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引用次数: 4

Abstract

For the past two decades SiGe BiCMOS process technologies have filled in several gaps in commercial semiconductor product requirements not satisfied by standard CMOS processes. While this roster of applications has evolved and shifted during this time, SiGe BiCMOS continues to prove itself as an attractive solution for both newly emerging circuit requirements and also as a cost-effective replacement for applications previously addressed by discrete III-V device technologies. In this paper the 21st century history of SiGe BiCMOS technology and applications will be discussed, followed by an overview of the current technology, markets and application spaces where SiGe BiCMOS plays a major role, and finally a discussion of future technology and application trends will be presented.
SiGe BiCMOS工艺技术的商业铸造前景
在过去的二十年中,SiGe BiCMOS工艺技术填补了标准CMOS工艺无法满足的商业半导体产品要求的几个空白。虽然在此期间,这些应用程序已经发展和转变,但SiGe BiCMOS继续证明自己是一种有吸引力的解决方案,既可以满足新兴电路要求,也可以作为以前由分立III-V器件技术解决的应用的经济高效替代品。本文将讨论SiGe BiCMOS技术和应用的21世纪历史,然后概述SiGe BiCMOS目前的技术、市场和应用空间,最后讨论未来的技术和应用趋势。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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