Removal of dilute SF/sub 6/ in emission gas by nonthermal plasma generated by pulsed power

Abstract

Investigation on removal method of SF/sub 6/ was carried out by using nonthermal plasma generated by pulsed power. We investigated the dependence of the discharge power and the polarity of applied pulsed voltage to the reactor on the removal rate of SF/sub 6/. The discharge power is varied with discharge repetition rate or charging voltage of the capacitor. As the discharge power increases, the removal rate of SF/sub 6/ is increases. The high repetition rate of pulse is more effective for removal of SF/sub 6/ than the big value of charging voltage. When the same discharge energy is supplied to the sample gas by changing the residence time or repetition rate, the removal rate is high in short residence time and high repetition rate. The removal rate of SF/sub 6/ for negative pulses is higher than that for positive ones. Consequently, the nonthermal plasma generated by pulsed power is effective to remove dilute SF/sub 6/ gas completely.