Infrared characteristics of ni-doped ZnO thin films

Jinghua Jiang, D. He, Yongsheng Wang, M. Fu, B. Feng, Changbin Ju, Yu-fan Du
{"title":"Infrared characteristics of ni-doped ZnO thin films","authors":"Jinghua Jiang, D. He, Yongsheng Wang, M. Fu, B. Feng, Changbin Ju, Yu-fan Du","doi":"10.1109/IPFA.2009.5232578","DOIUrl":null,"url":null,"abstract":"Ni-doped ZnO(ZnO:Ni)thin film had been studied widely as a ferromagnetic semiconductor, but there are far fewer studies on its infrared characteristics. This paper describes experiments in which Ni-doped ZnO thin films were deposited on quartz glass using a sol-gel process with different sintering temperatures. The infrared characteristics and the effects of the different fabrication processes were investigated using various techniques including X-ray diffraction (XRD), SEM and FT-IR.","PeriodicalId":210619,"journal":{"name":"2009 16th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits","volume":"100 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-07-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 16th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IPFA.2009.5232578","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Ni-doped ZnO(ZnO:Ni)thin film had been studied widely as a ferromagnetic semiconductor, but there are far fewer studies on its infrared characteristics. This paper describes experiments in which Ni-doped ZnO thin films were deposited on quartz glass using a sol-gel process with different sintering temperatures. The infrared characteristics and the effects of the different fabrication processes were investigated using various techniques including X-ray diffraction (XRD), SEM and FT-IR.
ni掺杂ZnO薄膜的红外特性
Ni掺杂ZnO(ZnO:Ni)薄膜作为一种铁磁半导体已经得到了广泛的研究,但对其红外特性的研究却很少。本文介绍了在不同烧结温度下,采用溶胶-凝胶法在石英玻璃上沉积ni掺杂ZnO薄膜的实验。利用x射线衍射(XRD)、扫描电镜(SEM)和傅里叶变换红外光谱(FT-IR)等多种技术研究了不同制备工艺的红外特性和影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信