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High-throughput additive manufacturing of thiol-based, oxygen-insensitive photoresins with digital micromirror devices (Conference Presentation)

Emerging Digital Micromirror Device Based Systems and Applications XI Pub Date : 2019-03-04 DOI:10.1117/12.2511496
W. Voit, Benjamin R. Lund, S. Kay, C. Lund
{"title":"High-throughput additive manufacturing of thiol-based, oxygen-insensitive photoresins with digital micromirror devices (Conference Presentation)","authors":"W. Voit, Benjamin R. Lund, S. Kay, C. Lund","doi":"10.1117/12.2511496","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":164467,"journal":{"name":"Emerging Digital Micromirror Device Based Systems and Applications XI","volume":"63 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-03-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Emerging Digital Micromirror Device Based Systems and Applications XI","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2511496","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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基于数字微镜器件的硫醇基氧不敏感光树脂的高通量增材制造(会议报告)
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Emerging Digital Micromirror Device Based Systems and Applications XI
Emerging Digital Micromirror Device Based Systems and Applications XI
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