Treatment of Pharmaceutical Industry Wastewater by PhotoelectroFenton Oxidation

A. Ateş, S. Ateş
{"title":"Treatment of Pharmaceutical Industry Wastewater by PhotoelectroFenton Oxidation","authors":"A. Ateş, S. Ateş","doi":"10.59287/icpis.845","DOIUrl":null,"url":null,"abstract":"The use of Photoelectro-Fenton oxidation to treat real pharmaceutical effluent is an attractiveoption for the elimination of complex and persistent organic contaminants. This advanced oxidation processcombines the electrochemical generation of highly reactive hydroxyl radicals (OH•) with the photochemicaldegradation of by-products, resulting in the efficient removal of pharmaceutical compounds fromwastewater. In the Photoelectro-Fenton process, an appropriate anode material, such as BDD or DSA, isused to generate OH•radicals through the electrochemical oxidation of Fe2+ ions. The addition of a smallamount of Fe2+ and H2O2 facilitates the Fenton reaction, leading to the production of additional OH•radicalsin the solution. The presence of these OH•radicals ensures the effective oxidation of pharmaceuticalpollutants, which are often resistant to conventional wastewater treatment methods. The use of UV orsunlight irradiation further enhances the Photoelectro-Fenton process by promoting thephotodecomposition of intermediate by-products formed during the oxidation process. This simultaneouselectrochemical and photochemical degradation mechanism provides synergistic effects, resulting inenhanced degradation and mineralization of pharmaceutical compounds. Studies have demonstrated thesuccessful application of Photoelectro-Fenton oxidation for the treatment of real pharmaceuticalwastewater, showing significant removal efficiencies for a wide range of pharmaceutical compounds,including antibiotics, analgesics, and hormones. Additionally, the process has been shown to effectivelydegrade recalcitrant by-products and reduce the overall toxicity of the wastewater. However, it is importantto consider factors such as optimal pH, Fe2+ and H2O2 dosages, irradiation intensity, and reaction time toachieve optimal treatment efficiency. Furthermore, the cost-effectiveness and scalability of thePhotoelectro-Fenton process need to be evaluated for its potential implementation in large-scale wastewatertreatment facilities.","PeriodicalId":292916,"journal":{"name":"International Conference on Pioneer and Innovative Studies","volume":"43 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Pioneer and Innovative Studies","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.59287/icpis.845","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

The use of Photoelectro-Fenton oxidation to treat real pharmaceutical effluent is an attractiveoption for the elimination of complex and persistent organic contaminants. This advanced oxidation processcombines the electrochemical generation of highly reactive hydroxyl radicals (OH•) with the photochemicaldegradation of by-products, resulting in the efficient removal of pharmaceutical compounds fromwastewater. In the Photoelectro-Fenton process, an appropriate anode material, such as BDD or DSA, isused to generate OH•radicals through the electrochemical oxidation of Fe2+ ions. The addition of a smallamount of Fe2+ and H2O2 facilitates the Fenton reaction, leading to the production of additional OH•radicalsin the solution. The presence of these OH•radicals ensures the effective oxidation of pharmaceuticalpollutants, which are often resistant to conventional wastewater treatment methods. The use of UV orsunlight irradiation further enhances the Photoelectro-Fenton process by promoting thephotodecomposition of intermediate by-products formed during the oxidation process. This simultaneouselectrochemical and photochemical degradation mechanism provides synergistic effects, resulting inenhanced degradation and mineralization of pharmaceutical compounds. Studies have demonstrated thesuccessful application of Photoelectro-Fenton oxidation for the treatment of real pharmaceuticalwastewater, showing significant removal efficiencies for a wide range of pharmaceutical compounds,including antibiotics, analgesics, and hormones. Additionally, the process has been shown to effectivelydegrade recalcitrant by-products and reduce the overall toxicity of the wastewater. However, it is importantto consider factors such as optimal pH, Fe2+ and H2O2 dosages, irradiation intensity, and reaction time toachieve optimal treatment efficiency. Furthermore, the cost-effectiveness and scalability of thePhotoelectro-Fenton process need to be evaluated for its potential implementation in large-scale wastewatertreatment facilities.
光电fenton氧化法处理制药工业废水
使用光电fenton氧化处理真正的制药废水是消除复杂和持久性有机污染物的一个有吸引力的选择。这种先进的氧化过程结合了电化学产生的高活性羟基自由基(OH•)和副产品的光化学降解,从而有效地去除废水中的药物化合物。在光电fenton工艺中,使用合适的阳极材料,如BDD或DSA,通过Fe2+离子的电化学氧化产生OH•自由基。少量Fe2+和H2O2的加入促进了Fenton反应,导致溶液中产生额外的OH•自由基。这些OH•自由基的存在确保了药物污染物的有效氧化,这些污染物通常对传统的废水处理方法具有抗性。紫外线或日光照射的使用通过促进氧化过程中形成的中间副产物的光分解进一步增强了光电芬顿过程。这种同时进行的电化学和光化学降解机制提供了协同效应,导致药物化合物的降解和矿化增强。研究已经证明光电- fenton氧化在实际制药废水处理中的成功应用,对多种药物化合物(包括抗生素、镇痛药和激素)显示出显著的去除效率。此外,该工艺已被证明可以有效地降解顽固的副产品,并降低废水的总体毒性。然而,要达到最佳处理效果,需要考虑最佳pH、Fe2+和H2O2用量、辐照强度和反应时间等因素。此外,需要评估光电- fenton工艺的成本效益和可扩展性,以确定其在大规模废水处理设施中的应用潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信