Transient photocurrent behavior in amorphous thin film heterostructures

O. Iaseniuc
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Abstract

The characteristics of transient photocurrent in amorphous heterostructures Al-As0.40S0.30Se0.30/Ge0.09As0.09Se0.82/Ge0.30As0.04S0.66–Al in the case of the positive polarity of the applied voltage at the top illuminated Al electrode are presented and discussed in this paper. The complex structure of the spectral distribution of the stationary (Fig. 1) and the transient (Fig. 3) photocurrent characteristics can be assigned to the different values of the optical band gap Eg of the involved amorphous layers (about Eg ~ 2.0 eV for As0.40S0.30Se0.30 and Ge0.09As0.09Se0.82; about Eg ~ 3.0 eV for Ge0.30As0.04S0.66). It is found that the dependence of photocurrent on light intensity has a power-law behavior Ipc ~ Fα(1.0 ≤ α ≤ 0.5), which is characteristic of amorphous semiconductors with an exponential distribution of localized states in the band gap.
非晶薄膜异质结构中的瞬态光电流行为
本文讨论了Al- as0.40 s0.30 se0.30 /Ge0.09As0.09Se0.82/ Ge0.30As0.04S0.66-Al非晶态异质结构在顶照射铝电极上施加正极性电压时的瞬态光电流特性。稳态(图1)和瞬态(图3)光电流特性的复杂结构的光谱分布可以归因于所涉及的非晶层的光学带隙Eg的不同值(约Eg ~ 2.0 eV为As0.40S0.30Se0.30和Ge0.09As0.09Se0.82;Ge0.30As0.04S0.66约Eg ~ 3.0 eV)。发现光电流随光强的变化具有幂律性质Ipc ~ Fα(1.0≤α≤0.5),这是非晶半导体带隙局域态呈指数分布的特征。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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