A. Martinez, N. Seoane, M. Aldegunde, A. Asenov, J. Barker
{"title":"The Non-equilibrium Green function approach as a TCAD tool for future CMOS technology","authors":"A. Martinez, N. Seoane, M. Aldegunde, A. Asenov, J. Barker","doi":"10.1109/SISPAD.2011.6035058","DOIUrl":null,"url":null,"abstract":"The potential of the Non-equilibrium Green function formalism as a new TCAD tool is demonstrated with concrete examples. We revise ballistic simulations of variability associated with discrete dopants and SiO2/Si interface roughness of silicon gate-all-around nanowire transistors. Phonon limited mobility in various nanowire cross-sections are calculated from the current-voltage characteristics, showing an agreement with previous calculations using different models. Using the same electron-phonon parameters, statistical simulations combining discrete dopants and surface roughness are carried out for a nanowire transistor. The use of renormalized physics in the formalism is highlighted. The majority of results use a coupled-mode-space representation in concomitance with a recursive algorithm to deliver fast and accurate results, even with the inclusion of dissipative physics.","PeriodicalId":264913,"journal":{"name":"2011 International Conference on Simulation of Semiconductor Processes and Devices","volume":"32 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-10-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 International Conference on Simulation of Semiconductor Processes and Devices","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SISPAD.2011.6035058","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
The potential of the Non-equilibrium Green function formalism as a new TCAD tool is demonstrated with concrete examples. We revise ballistic simulations of variability associated with discrete dopants and SiO2/Si interface roughness of silicon gate-all-around nanowire transistors. Phonon limited mobility in various nanowire cross-sections are calculated from the current-voltage characteristics, showing an agreement with previous calculations using different models. Using the same electron-phonon parameters, statistical simulations combining discrete dopants and surface roughness are carried out for a nanowire transistor. The use of renormalized physics in the formalism is highlighted. The majority of results use a coupled-mode-space representation in concomitance with a recursive algorithm to deliver fast and accurate results, even with the inclusion of dissipative physics.