Frequency multiplier design using BiCMOS-based multiple-peak NDR circuit

K. Gan, Ping-Feng Wu, Wu-Yan Shie, Cher-Shiung Tsai, Dong-Shong Liang, Cheng-Hsiung Tsai, W. Yeh
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引用次数: 0

Abstract

We demonstrate a novel frequency multiplier using the negative differential resistance (NDR) circuit based on the standard 0.35 µm BiCMOS technique. This NDR circuit is made of standard Si-based metal-oxide-semiconductor field-effect-transistor (MOS) and SiGe-based heterojunction bipolar transistor (HBT). We can obtain the three-peak NDR current-voltage (I-V) characteristics by connecting three MOS-HBT-NDR circuits in parallel. These I-V characteristics show high peak-to-valley current ratios with 7.5, 16.8, and 12.1 for three peaks, respectively. Using the folded I-V characteristics, we design a frequency multiplier which can multiply the input saw-tooth signal by a factor of four. The fabrication of this NDR-based frequency multiplier is easier and more convenient compared to the traditional resonant tunneling structure which is implemented by the complicated molecular-beam-epitaxy (MBE) system.
基于bicmos多峰NDR电路的倍频器设计
我们展示了一种新的基于标准0.35µm BiCMOS技术的负差分电阻(NDR)电路的倍频器。该NDR电路由标准硅基金属氧化物半导体场效应晶体管(MOS)和硅基异质结双极晶体管(HBT)组成。通过将3个MOS-HBT-NDR电路并联,可以得到NDR的三峰电流-电压(I-V)特性。这些I-V特性显示出三个峰的峰谷电流比分别为7.5、16.8和12.1。利用折叠的I-V特性,我们设计了一个可以将输入锯齿信号乘以4倍的倍频器。与复杂的分子束外延(MBE)系统实现的传统谐振隧道结构相比,这种基于ndr的倍频器的制作更加简单方便。
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