Low Power Operation of Resistive Switching Memory Device Using Novel W/Ge0.4Se0.6/Cu/Al Structure

S. Z. Rahaman, S. Maikap, Hsien-Chin Chiu, C. Lin, T. Wu, Y. Chen, P. Tzeng, Frederick T. Chen, M. Kao, Ming-Jinn Tsai
{"title":"Low Power Operation of Resistive Switching Memory Device Using Novel W/Ge0.4Se0.6/Cu/Al Structure","authors":"S. Z. Rahaman, S. Maikap, Hsien-Chin Chiu, C. Lin, T. Wu, Y. Chen, P. Tzeng, Frederick T. Chen, M. Kao, Ming-Jinn Tsai","doi":"10.1109/IMW.2009.5090597","DOIUrl":null,"url":null,"abstract":"Bipolar resistive switching memory device with a low power operation (200μA/1.3V) in a W/Ge0.4Se0.6/Cu/Al structure has been investigated. A stronger Cu chain formation can be observed by monitoring both the erase voltage and current. The low resistance state (RLow) decreases with increasing the programming current from 1nA to 500μA, which can be useful for multi-level of data storage. This resistive memory device has a large threshold voltage of ~0.5V, good resistance ratio (RHigh/RLow) of 1.6x10 2 , good endurance of >1.5x10 5 cycles, and excellent retention (>11 hours) with a resistance ratio of > 1.3×10 2 at 150 o C can be used in future nonvolatile memories.","PeriodicalId":113507,"journal":{"name":"2009 IEEE International Memory Workshop","volume":"16 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2009-05-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"9","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 IEEE International Memory Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMW.2009.5090597","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 9

Abstract

Bipolar resistive switching memory device with a low power operation (200μA/1.3V) in a W/Ge0.4Se0.6/Cu/Al structure has been investigated. A stronger Cu chain formation can be observed by monitoring both the erase voltage and current. The low resistance state (RLow) decreases with increasing the programming current from 1nA to 500μA, which can be useful for multi-level of data storage. This resistive memory device has a large threshold voltage of ~0.5V, good resistance ratio (RHigh/RLow) of 1.6x10 2 , good endurance of >1.5x10 5 cycles, and excellent retention (>11 hours) with a resistance ratio of > 1.3×10 2 at 150 o C can be used in future nonvolatile memories.
基于W/Ge0.4Se0.6/Cu/Al结构的阻性开关存储器件的低功耗工作
研究了W/Ge0.4Se0.6/Cu/Al结构下低功耗(200μA/1.3V)双极电阻开关存储器件。通过监测擦除电压和电流,可以观察到更强的铜链形成。当编程电流从1nA增加到500μA时,低阻状态(RLow)降低,可用于多级数据存储。该阻性存储器具有~0.5V的大阈值电压,1.6x10 2的良好电阻比(RHigh/RLow), >1.5x10 5个周期的良好耐久性,以及>11小时的优异保持性能,在150℃下电阻比> 1.3×10 2,可用于未来的非易失性存储器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信