Monitoring of ion implanters using multiple dopants

Abstract

A methodology for the monitoring and charting of the monitor results using multiple species on a single chart is demonstrated. The technique utilizes the concept of sensitivity in the correlation of the different species and the associated uniformities. The methodology permits the charting of the data in Equivalent Dose values or in Equivalent Boron Sheet Resistance values. Sheet resistance and sensitivity data for boron, arsenic, and phosphorus is presented from 1e14 to 1e16. Sensitivity is demonstrated to be the slope of the Sheet Resistance/Dose curve on a log log graph.