Modelling of an AlGaN/GaN Schottky diode and extraction of main parameters

L. Efthymiou, G. Longobardi, G. Camuso, A. P. Hsieh, F. Udrea
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引用次数: 6

Abstract

This paper describes a method to extract the ideality factor, barrier height and series resistance of a lateral AlGaN/GaN heterostructure power Schottky diode using a simple I-V measurement in on-state and sub-threshold domains. An analytical model previously developed for Gallium Arsenide (GaAs) and Silicon vertical diodes [1] is applied to lateral AlGaN/GaN Schottky diodes and calibrated using extensive experimental results. The validity of the model at increased temperatures (up to 428K) is also investigated and the dependence of the ideality factor and barrier height with temperature are obtained and assessed against those previously reported in the literature [2].
AlGaN/GaN肖特基二极管建模及主要参数提取
本文描述了一种在导通和亚阈值域使用简单的I-V测量方法提取横向AlGaN/GaN异质结构功率肖特基二极管的理想因子、势垒高度和串联电阻的方法。先前为砷化镓(GaAs)和硅垂直二极管开发的分析模型[1]应用于横向AlGaN/GaN肖特基二极管,并使用广泛的实验结果进行校准。还研究了该模型在更高温度(高达428K)下的有效性,并获得了理想因子和势垒高度与温度的依赖关系,并根据文献[2]中先前报道的结果进行了评估。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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