Ab initio quantum transport simulations of defective devices based on 2-D materials via a projected-GW approach

G. Gandus, J. Cao, T. Agarwal, M. Luisier, Y. Lee
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引用次数: 1

Abstract

We propose a novel ab inito defect modeling framework for devices based on two-dimensional (2-D) transition-metal dichalcogenide (TMDC) monolayers. The so-called projected (p)- GW method is combined with density functional theory and incorporated into the non-equilibrium Green’s function equations to efficiently and accurately investigate the influence of various defect types on the characteristics of 2-D field-effect transistors. Through quasi-particle correlated defect-level modeling, we show that one single defect located inside the channel under the gate is a main source to block the current flow, thus leading to a large performance degradation. Our variability study also confirms that defects inside transistors based on 2-D TMDC monolayers induce a significant threshold voltage shift and ON-state current variation.
基于投影gw方法的二维材料缺陷器件的从头算量子输运模拟
我们提出了一种新的基于二维(2-D)过渡金属二硫化物(TMDC)单层的器件从头到脚缺陷建模框架。投影(p)- GW方法将密度泛函理论与非平衡格林函数方程相结合,有效、准确地研究了各种缺陷类型对二维场效应晶体管特性的影响。通过准粒子相关缺陷级建模,我们发现位于栅极下通道内的单个缺陷是阻挡电流的主要来源,从而导致性能大幅下降。我们的可变性研究还证实,基于二维TMDC单层的晶体管内部缺陷会引起显著的阈值电压偏移和导通状态电流变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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