F. Costanzo, R. Giofré, A. Salvucci, G. Polli, E. Limiti
{"title":"A 4W 37.5-42.5 GHz Power Amplifier MMIC in GaN on Si Technology","authors":"F. Costanzo, R. Giofré, A. Salvucci, G. Polli, E. Limiti","doi":"10.1109/PRIME.2018.8430333","DOIUrl":null,"url":null,"abstract":"the design of a Q-band high power amplifier (HPA) in Microwave Monolithic Integrated Circuit (MMIC) technology is presented. The HPA is fabricated in a 100nm gate length Gallium Nitride on Silicon (GaN-Si) technology. The HPA, based on a four-stage architecture, was designed accounting for the de-rating rules foreseen for spatial use and to work in continuous wave (CW) conditions. Nevertheless, the realized HPA can provide a saturated output power larger than 36.5dBm with a gain and a power added efficiency higher than 22dB and 30%, respectively, in the operative band from 37.5GHz to 42.5GHz. The chip area is 3.54 × 3.5 mm2. Such results are in line with others state-of-art HPAs realized in more expensive GaN processes based on Silicon Carbide, thus demonstrating that high resistivity Silicon substrate can be efficiently adopted also in such a peculiar application.","PeriodicalId":384458,"journal":{"name":"2018 14th Conference on Ph.D. Research in Microelectronics and Electronics (PRIME)","volume":"101 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 14th Conference on Ph.D. Research in Microelectronics and Electronics (PRIME)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PRIME.2018.8430333","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
the design of a Q-band high power amplifier (HPA) in Microwave Monolithic Integrated Circuit (MMIC) technology is presented. The HPA is fabricated in a 100nm gate length Gallium Nitride on Silicon (GaN-Si) technology. The HPA, based on a four-stage architecture, was designed accounting for the de-rating rules foreseen for spatial use and to work in continuous wave (CW) conditions. Nevertheless, the realized HPA can provide a saturated output power larger than 36.5dBm with a gain and a power added efficiency higher than 22dB and 30%, respectively, in the operative band from 37.5GHz to 42.5GHz. The chip area is 3.54 × 3.5 mm2. Such results are in line with others state-of-art HPAs realized in more expensive GaN processes based on Silicon Carbide, thus demonstrating that high resistivity Silicon substrate can be efficiently adopted also in such a peculiar application.